, West Lafayette, IN, USA) or a 200 ��m diameter Ag/AgCl wire, respectively. All potentials are reported versus the Ag/AgCl reference electrode.2.3. Electrode Fabrication and Polymer ModificationThe MEA probes were fabricated at the Nanoelectronics Research Facility at UCLA. A 1 ��m thick layer of silicon dioxide was grown thermally on a thin (150 ��m) silicon substrate (Figure 1A). The thermal oxide is a high quality dielectric film that electrically isolates the substrate from the metal layer subsequently deposited. Electron-beam evaporation was used to deposit 1000 ? of platinum on a 200 ? chromium adhesion layer. The metal was patterned by photolithography and lift-off to define the bonding pads, connections, and electrode sites (Figure 1B).

Next, plasma enhanced chemical vapor deposition (PECVD) was used to deposit a 1 ��m layer of silicon dioxide (Figure 1C). This second dielectric layer chemically isolates the connections from solution during electrochemical testing. After patterning of the oxide layer with a conventional photolithographic technique, the contact pads and electrode sites were plasma etched by reactive ion etching (RIE) (Figure 1D). A third photolithographic treatment was performed to pattern the outline of the probes. RIE was then used to etch through the first and second dielectric layers, and deep reactive ion etching (DRIE) by the Bosch process was used to etch through the silicon substrate (Figure 1E).Figure 1.

Fabrication process flow diagram of silicon wafer-based MEA probe (cross-section view) (a) 1��m SiO2 was grown thermally on a 150-��m Si wafer.

(b) Cr and Pt were deposited by e-beam evaporation followed by a lift-off process to form the …After the MEA probes were individually released from the wafer they were packaged and chemically cleaned to prepare the Drug_discovery electrode surfaces for chemical modification with polymers and enzyme. Packaging involved soldering 28-gauge wire to the platinum bonding pads at the top of the MEA. Each MEA was cleaned with a 1:4 H2O2:H2SO4 solution. The tip of the MEA was lowered into the cleaning solution for 3 min and then rinsed with stirred purified H2O for 3 min; this process was repeated 3 times.

Following cleaning, the Carfilzomib electrodes were dried with argon. Each electrode was coated with PPy and Nafion. PPy was electrodeposited by holding the voltage constant at 0.85 V for 2.5�C5 min until a total charge density of 20 mC/cm2 was reached in a 200 mM argon-purged solution of pyrrole in PBS at pH 7.4. The polymer Nafion was deposited on the sites by rapid di
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